离子镀膜技术的进展:离子镀膜技术的进展
Progress of ion plating technology
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作 者:王福贞 刘欢 那日松
WANG Fu-zhen, LIU Huan, NA Ri-song (Vice-Dean of the Mechatronice College, Beijing Union University, Beijing 100020, China)
机构地区:北京联合大学机电学院,北京100020
出 处:《真空》 2014年第51卷第5期 1-8页,共8页
Vacuum
摘 要:本文概括地介绍了五十年来离子镀膜技术的发展概况,介绍了离子镀膜技术的意义、原理、特点、发展和应用范围。从D.M.Mattox发明离子镀膜技术以来的五十年中,离子镀膜技术适应高端产品加工和高新技术发展的要求,得到了飞速发展。各种激励气体放电过程技术,提高等离子体密度的措施层出不穷,满足各种需要的新的薄膜材料在各个应用领域得到了广泛的应用。对国防事业、宇航事业、高新技术产品和美化人民生活做出了突出贡献。我们期待离子镀膜技术继往开来,在新的五十年中再放光彩。
This paper introduced the progress, characteristics, application scope and meaning of the ion plating technology. In the past fifty years ion plating technology conformed to the requirements of high-end products processing and Hi-Tech development, and got rapid development. The emergence of incentive gas discharge technology and the measures to improve the density of plasma met the need in various fields of the thin films. These technology made contribution to national defense, space undertaking, high-tech products and civilian industry products.
关键词:离子镀膜技术 固态物质源离子镀膜技术 气态物质源离子镀膜技术 激励气体放电技术
ion plating technology ; solid material source ; gaseous material source ; incentive gas dischargetechnology ;